- aSRock 939Dual-SATA2 sli agp with pci-e - IBM 22nm EUV - organic plastic memory - ultra-compact camera optio a30 and Optio w30 -

	uspct is your : Video card - cpu - memory - Hard drive - power supply unit source

POSTER: computer news   ||   ASROCK 939DUAL-SATA2 SLI AGP WITH PCI-E	DATE:2007-02-26
Company NVIDIA very zealous related to the determination of enumeration chipsets, by which the support to technology SLI was permitted officially. Still before the acquisition of similar company, NVIDIA took decisive measures for the prohibition of support SLI by chipsets uLi. Even now, when these chipsets formally belong to the assortment of production NVIDIA, indulgences in the plan of compatability with SLI for them not provided. Meanwhile for some moment this did not prevent enthusiasts from excuting experiments with the chipset uLi through the realization of support SLI. The moreover, most persistent user went around much more complex protection in NVIDIA drivers ; therefore for sure and for the more contemporary versions of drivers something could be devised. Associates from the site OC workbench conducted the original experiment: motherboard aSRock 939Dual-SATA2 on chipset uLi m1695 + m1567 it was used as the platform, capable of combining in regime SLI two video card geForce 6600 GT with the different types of interfaces: PCI express x16 and AGP 8x respectively. Were used video card leadtek, the working at frequencies 475/900 MHz, and also certain modified drivers. This motherboard has slots PCI express x16 and AGP 8x, and video card  geForce 6600 GT with the interface AGP 8x it is built on the similar chip with support of PCI express x16, that also makes with the possible to combine two different video card in regime SLI. System assumes these video card for pair of identical graphic card model geForce 6600 GT, making possible to include support SLI. As you can be convinced, regime SFR works: Those desiring can study screen shot with the results benchmarks here. The uncommon experiment, practical benefit from which they can extract few, it is interesting by precisely its originality. aSRock 939Dual-SATA2 sli agp with pci-e	Add Comment ( 0 ) ASROCK 939DUAL-SATA2 SLI AGP WITH PCI-E

POSTER: computer news   ||   IBM 22NM EUV	DATE:2007-02-26
Than is good the lithograph with the use of ultrahard ultraviolet radiation, is more frequent that mentioned in the form of abbreviation EUV, we learned in 2005 because of company intel, which expects to inject this technology of within its 32 nm (0.032 m) technical process. If today's lithographic tools with the wavelength 193 nm make possible to create elements with the minimal sizes of 40-50 nm, then EUV- lithograph is capable of creating transistors with the aid of laser with wavelength 13,5 nm, i.e., using 14 times a thinner brush. Some information about the plans IBM on the passage to EUV- lithograph last week published site EE times. In the opinion experts, scaling contemporary immersion lithograph with the use 193 nm of tools beyond the limits of 40 nm technical process is associated with the technical difficulties, and passage to the EUV- lithograph many seemed the solution of problem. It was planned, that the introduction of this technology of start in 2009, in the production program IBM coinciding with the moment of passing n 3. nm technical process. However, the representatives OF IBM last week stated that the immersion lithograph with wavelength 193 nm will be used also for the production 22 nm (0.022 m) product, which puts aside the periods of introduction EUV- lithograph for later period. Problem in the fact that IBM will not have time to inject EUV- lithograph to 2009, although some developments in this sphere will be by this time actively conducted. Is possible, the active of EUV- technologies start only in the following decade, since even release 22 nm products IBM plans to achieve with the use of 193 nm of immersion lithograph. Such delays will not show influence on the graph of the mastery of the nearest technological  at the end 2007 IBM will start the mastery 45 nm technology, the company already reported about the successes in this sphere. Within the framework this technical process is planned to use 193 nm immersion lithograph. Accordingly, the same tools with the necessary modifications will be used, also, for the production 32 nm of products in 2009. It would be desirable to believe that adherence to the already known lithographic technologies to a certain extent  IBM from the problems upon transfer to the sequential technological standards. Many partners IBM will follow the analogous graph of  modernization lithographic technology. In their number will be AMD Chartered semiconductor, and also Infineon and Micron. Companies TSMC and UMC will begin to use a immersion lithograph of the within the framework 45 nm technical process or even earlier. The company intel intends to go by its : with the production of 45 nm processors it will forego the immersion lithograph with the application of special layer liquid between the projecting lens and the silicic plate of in favor traditional dry 193 nm of lithograph. The analogous dry version 193 nm lithograph now uses IBM for the production of its 65 nm of products. For the production 32 nm of processors intel it can as use EUV- lithograph, as already it promised, so also to inject immersion lithograph. According to the estimation of our associates from site EE times, the introduction of EUV- technology by the company intel is more probably already in the subsequent for 32 nm technical processes. IBM 22nm EUV	Add Comment ( 0 ) IBM 22NM EUV

POSTER: computer news   ||   ORGANIC PLASTIC MEMORY	DATE:2007-02-24
Source reports about the development of Singapore scientists, directed toward the creation of new memory instrument . At its basis will be the use of gold nanos-particle and organic semiconductor composition by the name pentacene (pentacene). As is asserted, the combination is indicated key step to the side of the creation of organic plastic memory, which can prove to be cheaper and more universal, than silicic. The created instrument has laminar structure. By way of enumeration from top to bottom, it consists in gold electrode, layer pentacene, gold nanos-particle, layer compound, which helps to nanos-particle to be retained on the lower layer, and lower layer - second electrode, which consists in silicon and dioxide silicon. Gold nanos-particle serve for storing the electric charge of the fulfillment of key function retention information. Nanos-particle by diameter from three to five nanometers they are located in one layer and they are fixed I will pour off citric acid. In order to ascertain that the received sandwich works as memory, scientists investigated its reaction to the accompanying volatge. The analogous structure, which does not contain the layer of gold nanos-particle, was used as the control model. The results of measurements showed that the control model does not preserve charge. But here sandwich with the gold nanos-particle behaved differently: under the action of negative voltage, the positively charged zones, called holes, penetrated pentacene, after which proved to be those seized by the layer of nanos-particle. Applying a positive tension, scientists attained the release holes conversely. In the opinion of participants in the project, the approach used by them, in view of its simplicity in the development and production, can lead to the appearance of new, cheaper and more universal memory. Work is the part of program, named polymeric and molecular electronics and instruments (Polymer and Molecular electronics and Devices, PMED), which carry out together the agency through the science, the technology and studies (Agency for science, Technology and Research, A * STAR) a organic plastic memory	Add Comment ( 0 ) ORGANIC PLASTIC MEMORY

POSTER: camera news   ||   ULTRA-COMPACT CAMERA OPTIO A30 AND OPTIO W30	DATE:2007-02-23
On the threshold of PMA 2007 company pentax presented two new product of family optio: 10 mega-pixel ultra-compact camera optio a30 and Optio w30. Pentax optio a30 will replace on the market the announced exactly half a year ago model optio  a20. new camera obtained fresh design and several new topical programs. Furthermore, to user are accessible the regimes of priority endurance and priority diaphragm. The range of sensitivity is extended to ISO 1600, and with the resolution 5 mp in the regime digital SR is possible to set up to ISO 3200. Is course in the camera used valuable optical stabilization system SR (Shake reduction), based on the principle of shift matrix. To the word, matrix itself remained as before - size 1/1,8 inches and resolution of 10,0 Mp. New product is capable of removing for 2 hours of video. . The remaining characteristics of camera practically did not changes. Including 7,1-megapixel 1/2,5- one - sensor. In sale optio a30 and Optio w30 they will appear already in the following month. After 10 mega-pixelIR will request about 350 dollars. ultra-compact camera optio a30 and Optio w30	Add Comment ( 0 ) ULTRA-COMPACT CAMERA OPTIO A30 AND OPTIO W30

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