nec 55- nm platform cb-55l

The corporation NEC electronics reported about the accessibility of 55- nm platform CB-55L for cell (cell-based) designs of the integrated circuits (IS), produced on the 55- nm technological process UX7LS, special feature of which is the use of insulators with the large dielectric constant (high- k).

NEC, now sells yearly cell IS for the sum of approximately 625 mln. dollars, plans to increase the volume of chips sales , produced on CB-55L, to 1 billion dollars for 2010. According to the data OF NEC electronics, the use in the KMOP- process UX7LS high- k dielectrics makes possible to decrease the current leakage by 75% in comparison with 90 nm process, for the first time neglected in 2002.

Energy consumption CB-55 is 1,7 nW/MHz/gate. The specific density of logic elements (gates) in comparison with the same 90 nm processes increased in the 55- nm technology by 230%, making possible to place over the area in to the square millimeter 925 thousand gates. A maximum quantity of gates in one chip composes 100 mln., numbers of ports input/output is 2800. The supply voltage to the core is 1..1, 2 [v], ports input/output : 1,8, 2,5 and 3,3 v. maximum clock frequency is 450 MHz with the supply voltage 1,2 v and 233 MHz with power from 1- v source.

As can be seen from specifications, CB-55L is intended for creating economical IS, used in portable devices with the autonomous power. And, as company in the press release asserts, NEC do not plan to develop more high speed version of platform.

Within the platform NEC it allows finished for the integration in the design controllers USB2.0, JPEG, DDR/OF DDR2 SDRAM, SDIO, chain of phase self-alignment, analog- digital and digital- analog conversion. Th microcircuits produced on CB-55L will be released in the form factors FPBGA, PBGA, FCBGA.

It is not-without-interest to also note that in CB-55L it is not planned to use a immersion lithograph for the complete cycle of production â€“ the semiconductor base layers they will be moistened only in the critical stages, remaining dry on all rest.

NEC 55- nm platform CB-55L

NEC 55- NM PLATFORM CB-55L