scanner nsr-s610c

Mastery of ever thinner standards of technological process goes by its turn. Thus far branch is determined, what technology to select for the passage to marks 32 and 22 nm, equipment for the production of chips according to the standards 45 nm with the use of a immersion lithograph places at the disposal of producers. The corporation nikon reported the dispatch of the first in the world system of this type, intended for the series production and capable of working according to the standards 45- nm technical process.
The discussion deals with the immersion scanner NSR-S610C, in which as the source of luminous radiation by a wavelength 193 nm is used excimer ArF- laser. As it communicates, the numerical value of the aperture of the projection optical system (NA) scanner composes 1,30 â€“ maximum value on the branch as a whole. Let us recall, the first information about NSR-S610C appeared approximately one year ago, in the course of the conference SPIE microlithography.

The scanner, officially represented during July of last year, is intended for the series production according to the standards 45 nm and can be used in the developments, connected with the passage to the 32- nm to standards and dual exhibition.

In NSR-S610C are personified such developments nikon as the technology local filling (Local fill technology), that prevented the appearance of defects, caused by heterogeneities in the liquid and plates, and Tandem stage : two-way technology, which makes possible to increase performance, accuracy and the long-term stability of results.

The name of company, which came forward in the role of customer, is not revealed. Known, however, that the discussion deals with one of the most important producers of microcircuits.

scanner NSR-S610C

SCANNER NSR-S610C